General terms and processes of vacuum coating technology
1.1 Vacuum coating: a method of making a film on a substrate under vacuum.
1.2 Substrate: Film bearer.
1.3 Test substrate testing substrate: the substrate used for measurement and (or) testing at the beginning, during or after coating.
1.4 Coating material: the raw material used to make the film.
1.5 evaporation material evaporationmaterial: the coating material used to evaporate in vacuum evaporation.
1.6 sputtering material sputteringmaterial: there are coating materials used for sputtering in vacuum sputtering.
1.7 Film material (film material) filmmaterial: the material that composes the film.
1.8 Evaporation rate: the amount of material evaporated in a given time interval, divided by the time interval
1.9 Sputtering rate: The amount of material sputtered in a given time interval divided by the time interval.
1.10 Deposition rate: In a given time interval, the amount of material deposited on the substrate, divided by the time interval and the surface area of ??the substrate.
1.11 Coating angle: The angle between the direction of particles incident on the substrate and the normal of the coated surface.
2.1 Vacuum evaporation coating: the vacuum coating process to evaporate the coating material.
2.1.1 Simultaneous evaporation: vacuum evaporation in which several evaporators are used to evaporate various evaporation materials onto the substrate at the same time.
2.1.2 Evaporation field evaporation: vacuum evaporation in which materials evaporated at the same time from the evaporation field are deposited on the substrate (this process is applied to large-area evaporation to obtain an ideal film thickness distribution).
2.1.3 Reactive vacuum evaporation reactivevacuumevaporation: the vacuum evaporation of the film material that obtains the chemical composition by reacting with gas.
2.1.4 Reactive vacuum evaporation in the evaporator reactivevacuumevaporationinevaporator: It reacts with various evaporation materials in the evaporator to obtain the vacuum evaporation of the film material of the ideal chemical composition.
2.1.5 Direct heating evaporation directheatingevaporation: The heat necessary for the evaporation of the evaporation material is the evaporation by heating the evaporation material itself (in a crucible or without a crucible).
2.1.6 Induction heating evaporation inducedheatingevaporation: The evaporation of the evaporation material heated by induction eddy current.
2.1.7 Electron beam evaporation electronbeamevaporation: The evaporation of heating the evaporation material by electron bombardment.